Dynamic Modeling Analysis for Control of Chemical Vapor Deposition

[+] Author and Article Information
M. A. Gevelber, M. Bufano, M. Toledo-Quiñones

Boston University, Manufacturing Engineering Department, Process Control Laboratory, 15 St. Mary’s St., Boston MA 02215

J. Dyn. Sys., Meas., Control 120(2), 164-169 (Jun 01, 1998) (6 pages) doi:10.1115/1.2802405 History: Received September 27, 1993; Online December 03, 2007


A nonlinear dynamic model of the chemical vapor deposition (CVD) process has been developed to aid design of a closed-loop control system. A lumped control volume analysis is used to capture important mass and fluid transients and spatial affects, while a simplified single variable equation is used to represent the complex reaction chemistry. Steady-state experimental results and model predictions are compared and the control implications of the process dynamics are discussed.

Copyright © 1998 by The American Society of Mechanical Engineers
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