Reduced Model Control of a Plasma Deposition Process

[+] Author and Article Information
S. M. Pandit, T. M. Demeny

Department of Mechanical Engineering—Engineering Mechanics, Michigan Technological University, Houghton, MI 49931

J. Dyn. Sys., Meas., Control 120(3), 398-401 (Sep 01, 1998) (4 pages) doi:10.1115/1.2805415 History: Received May 15, 1995; Online December 03, 2007


This preliminary study, relating plasma stagnation pressure to the current level, provided an initial step toward the development of feedback control of the plasma deposition process. Data consisting of an input voltage and output stagnation pressure were collected about a nominal operating point. Data Dependent Systems (DDS) methodology was utilized to obtain a high-order adequate model and then to reduce it to a first-order model suitable for feedback control. The power supply inductance was credited as the source of the single root characterizing the system. A minimum mean squared control strategy was employed to develop a control equation for the reduced system model. The simulation of the reduced order controller compared favorably with that of an optimal controller, based on the full model.

Copyright © 1998 by The American Society of Mechanical Engineers
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